Tohoku Univ. Technology : Method of Nitride coating : T18-275
Nitride can be coated more uniformly
Conventional nitride coating methods include CVD (chemical vapor deposition) and PVD (physical vapor deposition). However, there is a problem that the manufacturing process is complicated and the work is not efficient because pressure adjustment and atmosphere replacement by vacuum equipment are required. Therefore, the nitride coating in the atmospheric pressure has been developed, but there is a problem that the surface is uneven. The present invention shows follow features, and it can solve above problems. ・ TiN(Nitride coating) is formed by microwave process. ・ Vacuum process is not needed. ・ Nitride coating is formed more uniformly.
- Company：Tohoku Techno Arch Co., Ltd.
- Price：Other
